The first semiconductor 300mm wafers fab in Russia established in 2011 at the initiative of Rusnano. CNE manufacturing facility is capable of running backend of the line semiconductor processes for 90/65nm nodes. The company provides Non-Recurring Engineering for Process Flow Development, Prototyping and BEOL Foundry Services according to the requirements of an individual project. The company focuses on emerging technologies and devices:
– Non-volatile memory: MRAM and RRAM;
– Bio-electronic sensors;
– Advanced magnetic sensors;
– Integrated passive devices.

CNE is certified ISO 9001:2015